摘要
在真空蒸发硅的同时,分别用N离子和NH3离子轰击生长表面,获得具有不同H和N含量的a-SiNx和a-SiNx:H薄膜。对于这些薄膜,只要它们具有光电导特性,就可以观察到光电导衰减现象。实验分析表明,H在光电导衰减中不起直接作用,而是通过增大a-SiNx:H的光学能隙,使陷阱更为有效;以及减少Si≡Si-复合中心,从而有可能提高非平衡自由或流子密度和增强电荷被陷的速率,而间接地增强光电导衰减。
We use N and NH3 ion beam assited vacuum evaporation to deposite a-SiNx and a-SiNx:H films,respectively. The resulting films contain different H and N concentration. As long as these films are photoconducting,they appear photoconductivity degradation. The experiment shows that H does not play direct role in the degradation. However,H can increase the optical gap of a-SiNx,which makes trapping more effective. It can also reduce the density of the recombination centers of Si≡Si- dangling bonds,which would increase the excess carrier density and the rate of charge trapping. Boh of them speed the photoconductivity degradation.
出处
《真空科学与技术》
CSCD
北大核心
1997年第1期7-11,共5页
Vacuum Science and Technology
基金
国家教委留学回国人员科研启动基金
关键词
非晶
氮化硅
光电导衰减
真空蒸发
薄膜
a-SiN_x,Degradation of photoconductivity,Vacuum evaporation