摘要
采用磁过滤真空溅射离子沉积技术，研究了不同衬底负偏压下制备的样品的吸收光谱和光能隙，用632．8nm的椭圆偏振仪测量了膜的厚度和折射率．结果表明：衬底负偏压Vb在-50—20V范围内制备的样品，其光吸收主要是态的吸收，膜中有较多的SP3组份，光能降为3．1～3．4eV，形成无定形金刚石薄膜（a—D）
Amorphous diamond film (a-D) were prepared by deposition from magnetic filtered ions sputtering from graphite. The optical absorption spectra of a-D film deposited in diffrent substrate bias voltage condition were investigated. Thickness and refractive index of film were ellipsometrically measured. It is found that absorption of samples mainly results from a state, Optical band gap is 3.1 -3.4eV and the a-Dfilm with high SP3 fraction can be grown when the bias voltage range from-50V to-20V.
出处
《材料研究学报》
EI
CAS
CSCD
北大核心
1997年第1期81-84,共4页
Chinese Journal of Materials Research
基金
广东省高教局重点学科基金
