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氨浓度对化学水浴制备ZnS薄膜的影响 被引量:1

INFLUENCE OF NH3 CONCENTRATION ON THE ZnS THIN FILMS BY CHEMICAL BATH DEPOSITION
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摘要 以普通玻璃作为衬底用化学水浴法制备ZnS薄膜,溶液采用联氨体系。在沉积过程中,NH3浓度对ZnS薄膜本身的透明度、均匀性、平整性和透过性以及结晶性均有重要影响。采用扫描电镜(SEM)、能谱仪(EDS)、多功能高分辨率X射线衍射仪(XRD)和nkd-分光光度计等手段研究了不同氨水浓度对薄膜结构和性能的影响。结果表明:当氨浓度不大于1.5mol/L、沉积时间不超过1.5h时,可获得综合性能较好、接近化学计量比的ZnS薄膜,同时在红移方向上得到在较宽波长波段内透过率可达到95%以上的薄膜。 ZnS thin films were prepared by chemical bath deposition on common glass substrates. N2 H4 system was chosen in the experiment. NH3 concentration played a very important role on transparency, homogeneity, leveling, crystallinity and transmission of ZnS thin films during preparation. ZnS thin films were studied by XRD, SEM, EDS and nkd-system spectrophotometer. Results showed that the ZnS thin film has good property when NH3 concentration is lower than 1.5M and deposition time is less than 1.5h. The optical transmission was larger than 95 percents towards the direction of red movement within long wavelengths.
作者 刘庭芝 张萌
出处 《太阳能学报》 EI CAS CSCD 北大核心 2007年第5期513-516,共4页 Acta Energiae Solaris Sinica
关键词 ZNS薄膜 氨浓度 化学水浴法 ZnS thin films NH3 concentration chemical bath deposition
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