Cr靶电流对磁控溅射C/Cr复合镀层性能和结构的影响

The Effects of Cr Current on the Properties and Microstructures of Magnetron Sputtered C/Cr Composite Coatings

使用闭合场非平衡磁控溅射离子镀技术制备了C/Cr复合镀层,并研究了Cr靶电流对C/Cr复合镀层摩擦学性能的影响规律。采用XPS检测了C/Cr复合镀层的化学成分,采用XRD分析了镀层的晶相结构,采用SEM观察了镀层的表面和断口形貌。实验结果表明:使用较小的Cr靶电流能改善镀层表面质量,降低镀层摩擦系数;Cr靶电流过大时,镀层的性能明显下降。

C/Cr composite coatings were deposited by closed field unbalanced magnetron sputter iron plating technique. The effects of Cr current on the tribological properties of the C/Cr composite coatings were studied. The chemical compositions of the coatings were examined by XPS. The crystal phase structure of the coatings were analyzed using XRD and the coating surface and fracture morphology were observed using SEM. The results indicated that： C/Cr composite coatings with better surface quality and friction coefficient could be deposited by lower Cr current, and coatings deposited by high Cr current had undesirable properties.