高性能导电薄膜的制备

Preparation of high-performance conductive thin films

采用磁控溅射法在玻璃基底上制备了Cr-Cu-Al-Cr薄膜,用焊接法测试薄膜附着性能,用x射线衍射仪(XRD)、原子力显微镜(AFM)和台阶仪对薄膜进行表征,研究溅射过程中以及在高温大气环境下薄膜的防氧化方法,分析薄膜晶粒大小与电性能关系,制备出性能较好的导电膜。

Cr-Cu-Al-Cr thin films were deposited on glass substrates by magnetron sputtering. The adhesion of the films was tested by welding method. The films were characterized by x-ray diffraction （XRD）, atomic force microscopy （AFM） and surface profilometer to investigate the preparation of the thin film by way of improving the oxidation resistance in the magnetron sputtering process and high-temperature atmosphere in addition to discussing the relation between grain size and electrical properties.