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阳图PS版用重氮萘醌系感光组成物研究进展 被引量:2

The development of diazonaphthaquinone systems in positive presensitized plate
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摘要 目前PS版在印刷领域仍占有较重要地位,重氮萘醌系感光组成物自20世纪应用以来,经久不衰。文章主要介绍了PS版用重氮萘醌系感光组成物的研究进展情况,包括重氮类感光化合物,与之配合使用的版基、成膜树脂、酯化体。同时产酸剂、背景染料、溶剂及其它添加剂简单进行了归纳,并研究了重氮萘醌系阳图PS版的配方化学及发展趋势。 Now presensitized plate is worldwidely used in printing. Diazonaphthaquinone systems had been used in presensitized plate for hundred years. This article reviews the development of the diazonaphthaquinone systems. Except for diazonaphthaquinone compounds, we also have summed up printing plate, binder resin, ballast resin which worked in the systems. In the same time we have studied acid generator, dye and other additives. At last how to apply the diazonaphthaquinone composition in PS plate is introduced.
出处 《信息记录材料》 2007年第3期42-47,共6页 Information Recording Materials
关键词 PS版 重氮萘醌系感光组成物 成膜树脂 酯化体 Presensitized plate Diazonaphthaquinone systems Binder resin Ballast
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  • 1[1]Gary Ganghui Teng. et al.. Negative lithographic printing plates having a semisolid radiation-sensitive layer.US2003036019.
  • 2[2]Prakash Seth, et al. Thermally sensitive coating composition useful for lithographic elements. US2003008229.
  • 3[3]Ko Wakabayashi,et al. Studies on s-triazines,Ⅰ: Cotrimerization of trichloroacetonitrile with other nitriles. Bulletin of Chemical Society of Japan, 1969,42:2924~ 2930.
  • 4[4]Ko Wakabayashi,et al. Studies on s-triazines,Ⅱ: Cotrimerization of trichloroacetonitrile with thiocyanates. Bulletin of Chemic al Society of Japan, 1969,42: 2931 ~ 2937.
  • 5[5]Fred C. Schaefer, et al.. Syntheses of sym-triazine system,Ⅰ: Trimerization and cotrimerization of amidines. J. Am.Chem. Soc. , 1959,81:1466~ 1470.
  • 6余尚先,非银盐信息纪录材料及应用学术报告会论文集,1997年,2页

共引文献12

同被引文献50

  • 1武玲,余尚先.正性光致抗蚀剂主要成膜树脂──酚醛树脂[J].感光材料,1994(4):3-8. 被引量:5
  • 2Sato Tsutomu,Murata Atsushi.Positive type photosensitive resist composition for near infrared laser exposure[P].JP 2004133025,2004-4-30.
  • 3Tsurutani.Positive-working photosensitive lithographic plate and its manufacture[P].JP 2002072461,2002-08-29.
  • 4Tan Shiro.Positive-working lithographic plate containing alkyl acrylate polymer and quinonediazide compound[P].JP 2004117882,2004-04-15.
  • 5Miyake,Hideo.Method of making lithographic printing plate containing compound having enol ether group in photosensitive layer[P].JP 2004258491,2004-9-16.
  • 6Goto,Shigeto.Photosensitive composition and presensitized lithographic plate using same[P].JP 11119427,1999-04-30.
  • 7Shimizu Shinji,Kojima Yasuhiko,Koe Koji,et al.Posi-tire-working lithographic original plate and production of printing plate using same[P].JP 2000162784,2000-06-16.
  • 8姚新鼎,门红伟.一种乙烯基聚合物和含有该聚合物的感光性印刷版[P].CN 1752117A,2006-03-29.
  • 9Serikawa Takeshi,Imaizumi Atsuhiro,Endo Tadashi.Presensitized lithographic plate with intermediate layer and polyurethane photosensitive layer[P].JP 2000112119,2000-04-21.
  • 10Shiraishi Yuichi.Lithographic printing original plates for direct-platemaking by infrared laser light[P].JP2006018203,2006-01-19.

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