涤纶非织造布表面沉积ITO纳米薄膜的微观结构分析

The Analysis of Microstrcucture of Indium Tin Oxide Thin Films Deposited on Polyester Spunbonded Nonwovens

采用低温磁控溅射技术在涤纶纺粘非织造布表面沉积ITO(Indium Tin Oxide,铟锡氧化物)薄膜,利用原子力显微镜(AFM)观察ITO纳米薄膜在纤维表面沉积的微观结构,并较为系统地分析了溅射时间、溅射功率、氧气流量、气体压力以及基底温度对ITO透明导电薄膜微结构的影响。得到以下结论:沉积时间的长短、工作气体压力的大小对成膜的均匀性有很大影响;较高的射频溅射功率将导致纳米颗粒因团聚而增大;而氧气流量的大小则影响着颗粒结晶程度的好坏和晶粒尺寸的大小;基底温度升高则会导致颗粒产生热迁移现象。

ITO （Indium Tin Oxide） thin films are deposited on PET（polyester） spunbonded nonwovens by RF （radio frequency） magnetron sputtering using ITO sintered as the target and Ar（argon） as the working gas, AFM （Atomic Force Microscope） is also used to characterize the microstructures of ITO thin films deposited on the surface of PET fibers. This paper investigates the effects of several RF sputtering parameters,such as sputtering time,sputtering power,oxygen flow,gas pressure and substrate temperature,on microstructures of ITO thin films. The results indicate that sputtering time and gas pressure mainly affect the uniformity of the thin films. The nanoparticles size of ITO thin films increase with higher sputtering power and oxygen flow influences the crystallization and size of the sputtered nan- oparticles on the fibers. It is found that higher substrate temperatures cause the migration of ITO nanoparticles into the surface of PET fiber.