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GaN基HEMT栅终端场板结构研究 被引量:1

Study on the Gate-Terminated Field-Plates for GaN-Based HEMT
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摘要 制作了带有栅终端场板结构的GaN基HEMT,研究了击穿电压与场板长度的关系,提取了最佳场板长度为0.4,0.5,0.6μm时所对应的栅漏击穿电压最大,为120 V。研究了栅终端场板对器件小信号特性和大信号的影响,栅终端场板长度0.4μm时,器件特征频率及最大振荡频率减小量最小。在栅宽1 mm、频率8 GHz、无场板器件最大工作电压28 V时,连续波输出功率3.2 W,功率增益4.0 dB,功率附加效率17.0%;栅终端场板器件最大工作电压38 V时,连续波输出功率5.1 W,功率增益4.1 dB,功率附加效率21.0%。 GaN-based HEMT with the gate-terminated field plate was fabricated. Its breakdown voltage as a function of the length of field plates (Lfp) was studied and optimized. The maximum of gate-drain breakdown voltage was 120 V when Lfp varied between 0.4 μm to 0.6 μm. The decrease of the cut off frequency and the maximum frequency of oscillation caused by the field plates was minimized when LFP equaled to 0.4μm. At 8 GHz, device with lmm gate-width device with field plates showed a continuous wave output power of 5.1 W ( Vds = 38 V) with a large signal gain of 4.1 dB and a power added efficiency of 21.0% compared to 3.2 W, 4.0 dB and 17%, respectively, for device without the field plates.
出处 《半导体技术》 CAS CSCD 北大核心 2007年第6期478-480,489,共4页 Semiconductor Technology
关键词 GAN基HEMT 场板 击穿电压 GaN-based HEMT field-plates breakdown voltage
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参考文献8

  • 1张志国,杨瑞霞,李丽,李献杰,王勇,杨克武.GaN基HFET中极化诱导二维电子气和电流崩塌效应[J].半导体技术,2005,30(7):50-55. 被引量:3
  • 2ASIF K M,BHATTARAI A,HUZNIA J N,et al.High electron mobility transistor based on a GaN/AlxGa1-xN heterojunction[J].Appl Phys Lett,1993,63(9):1214-1215.
  • 3LI J,CAI S J,PAN G Z,et al.High breakdown voltage GaN HFET with field plate[J].EL,2001,37(3):196-197.
  • 4WU Y F,SAXLER A,Moore M,et al.30-W/mm GaN HEMTs by field plate optimization[J].IEEE Electron Device Lett,2004,25(3):117-119.
  • 5THERRIEN R,SINGHAL S,JOHNSON J W,et al.A 36mmGaN-on-Si HFET producing 368 W at 60 V with 70% drain efficiency[C]//IEDM.Washington DC,USA,2005:568-571.
  • 6ZHANG B.Power Semiconductor Devices and Smart Power ICs[M].成都:电子科技大学,2001:1-8.
  • 7GROVE A S,LEISTIKO O,HOOPER W W.Effect of surface fields on the breakdown voltage of planar silicon p-n junctions[J].IEEE Trans Electron Devices,1967,14(3):157-162.
  • 8陈星弼.功率MODFET与高压集成电路[M].成都:电了科技大学,1989.

二级参考文献17

  • 1AMBACHER O, FOUTZ B, SMART J, et al, Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructure[J]. J Appl Phys, 2000, 87(1):334-344.
  • 2AMBACHER O, SMART J, SHEALY J R, et al. Two dimensional electron gases induced by spontaneous and piezoelectric polarization charge in N- and Ga-face AlGaN/GaN heterostructure[J].J Appl Phys, 1999, 85(6): 3222-3233.
  • 3VETURY R, SMORCHKOVA I P, ELSASS C R, et al. Polarization induced 2DEG in MBE grown AlGaN/GaN HEMTs: On the origin,DC and RF characterization [Z]. Mat Res Soc,2000, 622.
  • 4IBBETSON J P, FINI P T, NESS K D, et al. Polarization effects,surface states,and the source of electrons in AlGaN/GaN HFETs[J]. Appl Phys Lett, 2000,77(2):250-252.
  • 5WANG C X, TSUBAKI K, KOBAYASHI N, et al. Electron transport properties in AlGaN/InGaN/GaN double heterostructures grown by MOVPE[J]. Appl Phys Lett,2004, 84(13):2313-2315.
  • 6VETURY R, ZHANG Q, KELLER S, et al. The impact of surface ststes on DC and RF characteristics of AlGaN/GaN HFETs, IEEE Trans Eleectron Device,2001,48(3):560-566.
  • 7GREEN B M, CHU K K, CHUMBES E M, et al. The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMT[J]. IEEE Electron Devices Lett,2000,21(6):268-270.
  • 8WU Y F, KELLER B.P, KELLER S, et al. GaN-based FETs for microwave power amplification[J]. IEICE Trans on Electron[J]. 1999, E82-C(11):1895-1905.
  • 9MITTEREDER J A., BINARI,S C, KLEIN P B,et al,Current collapse induced in AlGaN/GaN HEMTs by bias stress[J]. Appl Phys Lett, 2003,83(8):1650-1652.
  • 10VERZELLESI PIEROBON G R, RAMPAZZO F, et al.Experimental numerical investigation on current collapse in AlGaNGaN HEMTs[A]. IEEE IEDM Tech. Dig.[C]. San Francisco, California,2002,103-106.

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