RF等离子体CVD合成氮化碳薄膜的XPS研究

The Application Research on Ferromagnetic Fluid Lineal Seal

采用射频等离子体化学气相沉积技术合成氮化碳薄膜，测量其Ｘ射线光电子能谱（ＸＰＳ），获得两组Ｃ（１ｓ）电子和Ｎ（１ｓ）电子结合能，它们是Ｅ（Ｃ１）＝３９８．０～３９８．７ｅＶ，Ｅ（Ｃ２）＝２８４．６～２８４．８ｅＶ；Ｅ（Ｎ１）＝３９８．０～３９８．７ｅＶ，Ｅ（Ｎ２）＝４００．０～４００．９ｅＶ。证实了薄膜中碳原子存在ｓｐ３杂化轨道成键和ｓｐ２杂化轨道成键两种键合形式。该方法合成的氮化碳薄膜含氮量在１２．０～５３．７％，含氮量随沉积时氮气流量的增大而增大。

The carbon nitride films have been deposited by RF CVD and investigated with X ray photoelectron spectroscopy. The result indicates that there are two couples of binding energies for C (1s) and N(1s). It is suggested that carbon atoms are bonded to nitrogen atoms with sp 2 and sp 3 structures. The N content of the films prepared by RF CVD is in the range of 12.0～53.7%,and rises with the increase of N 2 flow rate during the depositing.