放电电流对热阴极等离子体化学气相沉积金刚石膜影响

Influence of discharge current on hot cathode plasma chemical vapor deposition of diamond films

建立了快速沉积高品质金刚石膜的热阴极辉光放电等离子体化学气相沉积新方法．相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，具有许多新的特性，其中重要一点是具有较高的放电电流（6．0～10．0A）．较高的放电电流既是热阴极辉光放电本身的突出特点，同时对于化学气相沉积金刚石膜工艺也产生重要影响．实验研究了放电电流于金刚石膜沉积速率、表面形貌和热导率的影响，发现由于放电电流影响辉光放电的等离子体区和阳极区，进而对金刚石膜的沉积速率和品质有很大影响．特别是通过放电电流的提高，可以有效地提高金刚石膜的品质，这对于制备优质金刚石膜产品有重大意义．

Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate. Compared with the conventional cold cathode glow discharge, the hot cathode glow discharge is a new type of gas discharge. It has many new characters, one of which is that the discharge current is quite high - about 6.0-10.0 A. The great discharge current has an important influence on the deposition of diamond films. The influence of discharge current on the deposition rate, surface morphology and thermal conductivity of diamond films is discussed. The experimental results show that the discharge current has critical influence on the deposition rate and quality of diamond films due to its influence on the plasma region and anode region of the discharge plasma. Especially, the increase of the discharge current can increase the film quality effectively, which is quite significant to the production of high-quality diamond films.