摘要
控制工艺参数，用直流等离于化学气相沉积（DCPCVD）装置，对碳钢、合金结构钢、高速钢等沉积Si3N4非晶态薄膜，并研究了薄膜的成分、结构。
Si3N4 thin film has been deposited on the matrixes of carbon steels, alloy structure steels, speed steels and stainless steels by using a direct current plasma chemical vapor deposition (DC-PCVD) device under controlling processing parameters. Component,structure, morphology and hardness of the film were measured. This thin film consists mainly of the component of Si3N4 with amorphous structure.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1997年第3期320-324,共5页
Acta Metallurgica Sinica
基金
国家自然科学基金
