离子束增强沉积纳米Fe-N磁性膜

Formation of nanometer magnetic iron nitride films by ion beam enhanced deposition

利用高能量（＞１５ｋｅＶ）、脉冲氮离子束增强沉积（ＩＢＥＤ）Ｆｅ－Ｎ磁性薄膜．合成了含有α－Ｆｅ、α″－Ｆｅ１６Ｎ２、γ′－Ｆｅ４Ｎ和ε－Ｆｅ２～３Ｎ相的纳米多晶薄膜．Ｆｅ－Ｎ薄膜的磁性取决于膜层的相结构及微观形貌．纳米尺度的α″－Ｆｅ１６Ｎ２和α－Ｆｅ相的混合物膜层的饱和磁化强度可达２４５ｅｍｕ／ｇ．多元ＩＢＥＤＦｅ－Ｃｏ－Ｎ合金薄膜与相同制备条件下合成的Ｆｅ－Ｎ薄膜相比，其相结构相似，但饱和磁化强度提高，矫顽力降低．

The nanometer magnetic iron nitride films have been formed by a pulsed nitrogen ion beam enhanced deposition. The films consisting of α Fe, α″ Fe 16 N 2, γ′ Fe 4N, and ε Fe 2￣3 N phases are typical nanometer polycrystallines. The saturated magnetizability of the films containing α″ Fe 16 N 2 and α Fe phases is 245 emu/g. The iron nitride composite films with cobalt have been also formed by simultaneous ion beam enhanced deposition, whose magnetic properties are improved in comparison with those of iron nitride films formed under the same processing conditions.