化学气相沉积钽限制性环节初探

Study on a Restriction Link about CVD of Tantalum

本实验用氯气将钽块氯化，然后用氢还原，在镍基合金上沉积出致密的钽涂层。根据反应速度和温度的关系，求出反应的活化能。

In this experiment,a piece of tantalum is chlorinated by chlorine and reduced by hydrogen,then compact tantalum coating is deposited on the nickel group alloy.According to the relationship of reacting speed and temperature,counts reaction activation energy and confirms that the face reaction is a restriction link of reacting course.