期刊文献+
任意字段
题名或关键词
题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

面向Top-Down设计流的表面微加工掩膜推导方法 被引量：2

Mask Deduction for Surface Micromachining to Support Top-Down Design Flow
下载PDF
导出
摘要 针对表面硅微加工,运用层模型间几何元素运算获得粗掩膜的基本数据.采用工艺约束修演得到精掩膜,解决了多层刻蚀与可加工性问题,并进行模型重构,以校正设计模型的工艺不合理性.应用协同的方法解决了设计端模块与工艺端模块的集成问题,最终得到优化的设计模型和掩膜序列. Based on surface micromachini the operation on geometric elements among ng process, the rough mask information is obtained by means of the layer models. The precise mask then is formed by revising the rough mask based on the process restrictions. Together with the reconstruction of the process model, the mask revision resolves the problem of multiple-layer etching and improves the manufacturability. The CAPP and CAD modules for micro devices are integrated coordinately to get an optimized design model and mask set.
作者 刘峥 江平宇
机构地区 西安交通大学机械制造系统工程国家重点实验室 西安交通大学CAD/CAM研究所
出处 《计算机辅助设计与图形学学报》 EI CSCD 北大核心 2007年第6期798-803,共6页 Journal of Computer-Aided Design & Computer Graphics
基金 国家自然科学基金(50375118).
关键词 微器件 掩膜推导 Top—Down 工艺模型 表面微加工 micro device mask deduction Top-Down process model surface micromachining
分类号 TP391.7 [自动化与计算机技术—计算机应用技术]
  • 相关文献

参考文献8

  • 1Mccorquodale M S,Gebara F H,Kraver K L,et al.A topdown microsystems design methodology and associated challenges[C]//Proceedings of the Design,Automation and Test in Europe Conference and Exhibition.Los Alamitos,CA:IEEE Computer Society,2003:292-296
  • 2Gao Feng,Hong Y S,Sarma R.Feature model for surface micro-machined MEMS[CD]//Proceedings of ASME Design Engineering Technical Conferences,Chicago,2003:DETC 2003/CIE-48186
  • 3Ananthakrishnan V,Sarma R,Ananthasuresh G K.Systematic mask synthesis for surface micromachined microelectromechanical systems[J].Journal of Micromechanics and Microengineering.2003,13(6):927-941
  • 4周荣春,张海霞,郝一龙.微加工干法刻蚀工艺模拟工具的研究现状[J].微纳电子技术,2003,40(7):5-7. 被引量：7
  • 5Zaman M H,Carlen T,Mastrangelo C H.Automatic generation of thin film process flows-Part I:basic algorithms[J].IEEE Transactions on Semiconductor Manufacturing,1999,12(1):116-128
  • 6Schiek R,Schmidt R.Automated surface micro-machining mask creation from a 3D model[J].Microsystem Technologies,2006,12(3):204-207
  • 7Ma Lin,Antonsson E K.Automated mask-layout and process synthesis for MEMS[C]//Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems,San Diego,2000:20-23
  • 8Carter J,Cowen A,Hardy B,et al.PolyMUMPs Design Handbook[M].Revision 11.0.Durham:MEMSCAP Inc.2005

二级参考文献5

  • 1[1]OLDHAM W G, NEUREUTHER A R, SUNG C, et al. A general simulator for VLSI lithography and etching process: Part ii -- Application to deposition and etching [J].IEEE Trans Electron Devices, 1980, 27: 1455.
  • 2[2]MCVITTIE J P. J. REY C, CHENG L Y, et al. LPCVD profile simulation using a Re-emission model [A]. IEDM 90[C].1990, 917-920.
  • 3[3]HARAFUJI K, MISAKA A. Dry etching topography simulator with a new surface reaction model: MODERN [J]. IEEE Trans Electron Devices 1995, 42: 1903.
  • 4[4]TAZAWA S, MATSUO S, SAITO K.A General characterization and simulation method for deposition and etching technology [J].IEEE Trans Semicond Manuf, 1992, 5 :27.
  • 5[5]ZHOU R C, ZHANG H X, HAO Y Y, et al. Simulation of profile evolution in etching-polymerization alternation in DRIE of silicon with SF6/C4F8 [A]. MEMS 03 [C]. 2003, 161-164.

共引文献6

同被引文献18

  • 1李涛,钟诗胜.基于着色时间Petri网的工作流模型及其性能分析[J].计算机辅助设计与图形学学报,2006,18(6):824-831. 被引量：12
  • 2李建华,刘玉生,高曙明.表面微加工MEMS器件工艺层模型可制造性评价[J].浙江大学学报（工学版）,2006,40(10):1669-1674. 被引量：2
  • 3Jang G W, Kim K J, Kim Y Y. Integrated topology and shape optimization software for compliant MEMS mechanism design [J]. Advances in Engineering Software, 2008, 39 (1) :1-14.
  • 4Mukherjee T, Fedder G K, Blanton R D. Hierarchical design and test of integrated microsystems [J]. IEEE Design and Test of Computers, 1999, 16(4): 18-27.
  • 5Romanowicz B F, Bart S F, Gilbert J R. Integrated CAD tools for top down design of MEMS/MOEMS systems [C]// Proceedings of SHE, Paris, 1999, 3680:171-178.
  • 6Nguyen L, Lee H J, Maher M A, et al. Structured CAD methodology for integrated MEMS and IC design [C]// Proceedings of SPIE, Paris, 1999, 3680: 259-265.
  • 7Fan Z, Wang J C, Achiche S, et al. Structured synthesis of MEMS using evolutionary approaches [J]. Applied Soft Computing, 2008, 8(1): 579-589.
  • 8Lerbet J. About the synchronization of MEMs [J]. Nonlinear Analysis: Real World Applications, 2009, 10(1): 266-276.
  • 9Kim G H, Park K C. A continuum based modeling of MEMS devices for estimating their resonant frequencies [J]. Computer Methods in Applied Mechanics and Engineering, 2008, 198(2): 234-244.
  • 10Liu Y, Jiang P Y, Zhang D H, et al. 3D-feature-based structure design for silicon fabrication of micro devices [J]. Microsystem Technologies, 2007, 13(7): 701-714.

引证文献2

二级引证文献4

计算机辅助设计与图形学学报
2007年 第6期

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部