摘要
基于Synopsys Inc.最新推出的新一代nm级IC制程工艺设计工具--SenTaurus Process,实现了CMOS架构的nm级NMOS制程的工艺级可制造性设计。仿真结果体现了SenTaurus Process的强大功能和使用SenTaurus Process进行工艺级可制造性设计的必要性。
Based on the elementary functions of the new generation nano-level IC process design tool： SenTaurus Process issued recently by Synopsys Inc, nano-level NMOS process level DFM based on CMOS framework was realized. Simulated results reveal the powerful functions of Sen- Taurus Process and the necessity of technology-level design for manufacturing using SenTaurus Process.
出处
《微纳电子技术》
CAS
2007年第6期295-298,311,共5页
Micronanoelectronic Technology
