摘要
The acrylonitrile-butadiene-styrene （ABS） surface was etched by dipping it into chromic acid-sulfuric acid containing a trace amount of palladium. The surface roughness, activity, and valence bond were characterized by atomic force microscopy （AFM） and X-ray photoelectron spectroscopy （XPS）. The results showed that with the increase of Pd concentration in the etching solution the ABS surface roughness reduced. The ratio of O to C increases and forms a large amount of O=C？O functional groups by dipping into Pd contained etching solution, thus the amount of colloids palladium adsorption increases. The carboxyl group acts as the ad- sorption site for the Pd/Sn catalyst.
The acrylonitrile-butadiene-styrene （ABS） surface was etched by dipping it into chromic acid-sulfuric acid containing a trace amount of palladium. The surface roughness, activity, and valence bond were characterized by atomic force microscopy （AFM） and X-ray photoelectron spectroscopy （XPS）. The results showed that with the increase of Pd concentration in the etching solution the ABS surface roughness reduced. The ratio of O to C increases and forms a large amount of O=C？O functional groups by dipping into Pd contained etching solution, thus the amount of colloids palladium adsorption increases. The carboxyl group acts as the ad- sorption site for the Pd/Sn catalyst.
基金
the National Doctorial Research Foundation of China (No.20030213007).
