不同工况下薄膜生长结构的计算机模拟

Computer simulation of thin films growing microstructure in different conditions

用蒙特卡罗方法，在计算机上模拟了不同工况下薄膜的生长结构，证明了阴影效应和沉积原子的有限迁移是导致柱状结构的原因．采用离子束辅助沉积工艺，可提高膜层聚集密度。

The microstructure of growing thin films in different conditions are simulated with Monte Carlo method by computer.It is demonstrated that shadowing effect and limited mobility of the deposited atoms are the main reason for the formation of the columnar microstructure .It can increase the packing density and decrease the columnar microstructure of thin films with IAD technology.