辅助外加热直流等离子体中放电参数的影响

The Effect on the Parameter of DC Plasma Vapour Deposition

由于采用辅助外加热式离子轰击，减少了放电对放电工件形状、位置的影响，与单纯靠离子轰击放电加热时的放电电流及电压加以比较得出其优点所在。

Plasma-assisted chemical vapour deposition is a modern technique for depositing various hard coatings on different materials and geometriecally complicated substrates. A DC electrical glow discharge was used in this process to increase the activation of species witch form the TiN layer. By use of an auxiliary heating source,it has a advantage for different geometries of workpieces and for different workload size.