期刊文献+

PVT法生长大直径6H-SiC晶体感应加热对系统的影响 被引量:4

Effects of Different Height and Space of a Multi-turn Inductive Coil on Temperature Distribution in the Large-size 6H-SiC Growth System
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摘要 采用有限元分析法系统地研究了大尺寸6H-SiC晶体PVT法生长装置中感应加热线圈的不同高度和匝间距对生长腔、粉源以及晶体生长温度场的影响;分析比较了线圈不同高度和匝间距时晶体生长面径向温度梯度的变化。结果表明:在中频电源的输出功率和频率固定,盲孔内径不变的情况下,通过调整线圈匝间距和高度可以减小晶体生长面径向温度梯度,改善晶体的质量,同时又有较高的生长速率。 In this paper, the influences of different spaces between turns of the induction coil and different relative positions between the coil and the crucible on the temperature distribution of the growth chamber, SiC powder and the radial temperature gradients of crystal growth surfaces have been investigated systematically for the large size 6H-SiC growth. All simulation results indicate that the temperature field in the growth system can be optimized by adjusting the height and spaces between turns of inductive coil, assuming that the output power and frequency, as well as inner radius of blind hole are constant.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2007年第1期180-183,共4页 Journal of Synthetic Crystals
基金 陕西省重大科技创新项目(No.2004K07-G9) 西安理工大学优秀博士学位论文研究基金资助项目
关键词 PVT法 SiC粉源 温度场 温度梯度 PVT method SiC powder temperature distribution temperature gradient
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参考文献9

  • 1陈治明 王建农.半导体器件材料物理学基础[M](第一版)[M].北京:科学出版社,2003.369.
  • 2Egorov Y E,et al.Modeling Analysis of Temperature Field and Species Transport Inside the System for Sublimation Growth of SiC in Tantalum Container[J].Mat.Sci.Forum,1998,264:61.
  • 3Pons M,et al.State of the Art in the Modelling of SiC Sublimation Growth[J].Mater.Sci.Eng.,1999,B61:18.
  • 4Ramm M S,et al.Optimization of Sublimation Growth of SiC Bulk Crystals Using Modeling[J].Mater.Sci.Eng.,1999,B61:107.
  • 5Bubner N,et al.A Transient Model for the Sublimation Growth of Silicon Carbide Single Crystals[J].J.Crystal Growth,1999,205:294.
  • 6张群社,陈治明,蒲红斌,李留臣,封先锋,巩泽龙.SiC晶体PVT生长系统的流体力学模型及其有限元分析[J].人工晶体学报,2005,34(5):828-832. 被引量:10
  • 7张群社,陈治明,李留臣,蒲红斌,封先锋,陈曦.不同耦合间隙对大直径SiC晶体生长感应加热系统的影响[J].人工晶体学报,2006,35(4):781-784. 被引量:4
  • 8Klein O,et al.Transient Numerical Investigation of Induction Heating During the Sublimation Growth of Silicon Carbide Single Crystals[J].J.Crystal Growth,2003,247:219.
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二级参考文献16

  • 1张群社,陈治明,蒲红斌,李留臣,封先锋,巩泽龙.SiC晶体PVT生长系统的流体力学模型及其有限元分析[J].人工晶体学报,2005,34(5):828-832. 被引量:10
  • 2陈治明 王建农.半导体器件材料物理学基础[M](第一版)[M].北京:科学出版社,2003.369.
  • 3Chourou K,et al. Modelling of SiC Sublimation Growth Process[J]. Mater. Sci. Eng. ,1999,B61: 82.
  • 4Yu E. Egorov, et al. Modelling Analysis of TemPerature Field and Species Transport inside the System for Sublimation Growth of SiC in Tantalum Container[ J ]. Mat. Sci. Forum, 1998,2,64:61.
  • 5Pons M,et al. State of the Art in the Modelling of SiC Sublimation Growth[J]. Mater. Sci. Eng. , 1999 ,B61:18.
  • 6Ramm M S, et al. Optimization of Sublimation Growth of SiC Bulk Crystals Using Modelling[ J ]. Mater. Sci. Eng. , 1999,B61:107.
  • 7Bubner N, et al. A Transient Model for the Sublimation Growth of Silicon Carbide Single Crystals [J]. J. Crystal Growth, 1999,205:294.
  • 8Klein O,et al. Radiation- and Convection-driven Transient Heat Transfer during Sublimation Growth of Silicon Carbide Single Crystals[J]. J.Crystal Growth ,2001,222:832.
  • 9Lide D R. CRC Handbook of Chemistry and Physics [ M]. Boca Raton,USA:CRC Press,1995:267.
  • 10陈治明,王建农.半导体器件材料物理学基础[M].北京:科学出版社,2003:360.

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