摘要
实现了一种新型刻蚀深度实时检测系统,整个系统对温度漂移,气体流动与外界振动等环境因素极不敏感,系统测量误差小于0.98%,实现了在真空环境下刻蚀深度的实时监视与检测。
A novel real time system for etching depth measurement is demostrated. The system is not sensitive to instability, temperature variation and gaseous flow. The measurement error is small than 0.98%. We realized the real time test of etching depth in vavuum environment. This has practical significance to binary optics micro fabrication.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1997年第6期745-749,共5页
Acta Optica Sinica
基金
国家自然科学基金