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反应磁控溅射法制备TiO_2薄膜

Preparing TiO_2 Films by Reactive Magnetron Sputtering
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摘要 采用反应磁控溅射法在不同条件下制备了TiO2薄膜样品,研究了衬底温度、氧分压、溅射压强等生长条件对薄膜结构特性的影响.得到了反应磁控溅射法制备锐钛矿相TiO2薄膜的最佳沉积条件,并对薄膜的表面形貌进行了测量. TiO2 films were deposited by reactive magnetron sputtering at different conditions. The influences of the deposition conditions such as substrate temperature, O2 partial pressure and sputtering pressure on the structural properties of the films were studied. The optional process conditions to prepare Anatase TiO2 film was discussed.
作者 谭永胜 龚恒翔 方泽波
机构地区 绍兴文理学院物电系
出处 《绍兴文理学院学报》 2007年第8期44-46,50,共4页 Journal of Shaoxing University
基金 绍兴市科技局基金项目(20031412004147)
关键词 TIO2薄膜 反应磁控溅射 沉积条件 TiO2 film reactive magnetron sputtering deposition conditions
分类号 O484.1 [理学—固体物理]
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参考文献9

  • 1[1]A.Fujishima,X.Zhang,Titanium dioxide photocatalysis:present situation and future approaches[J].C.R.Chimie,2006,9:750-760.
  • 2[2]A.Fujishima,Tata N.Rao,D.A.Tryk.TiO2 photocatalysts and diamond electrodes[J].Electrochimica Acta.2000,45:4683-4690.
  • 3[3]C.-K.Junga,S.B.Leea,J.-H.Boo,et al.Characterization of growth behavior and structural properties of TiO2 thinfilms grown on Si(100) and Si(111) substrates[J].Surface and Coatings Technology.2003,174 -175:296-302.
  • 4[4]Chantal Guillard,Bernard Beaugiraud,Cédric Dutriez et al.Physicochemical properties and photocatalytic activities of TiO2-films prepared by sol-gel methods[J].Applied Catalysis B:Environmental,2002,39:331-342.
  • 5[5]Ulrika Backman,Ari Auvinen,Jorma K.Jokiniemi,Deposition of nanostructured titania films by particle-assisted MOCVD[J],Surface & Coatings Technology,2005,192:81-87.
  • 6[6]V.G.Bessergeneva,I.V.Khmelinskiia,R.J.F.Pereira et al.Preparation of TiO2 films by CVD method and its electrical,structural and optical properties[J].Vacuum,2002,64:275-279.
  • 7[7]Mark C.Barnes,Sunil Kumar,Len Green.The mechanism of low temperature deposition of crystalline anatase by reactive DC magnetron sputtering[J].Surface & Coatings Technology,2005,190:321-330.
  • 8邵艳群,唐电,熊惟皓,张腾.Sol-gel法制备纳米TiO2锐钛矿相的晶化动力学[J].材料热处理学报,2003,24(4):46-50. 被引量：5
  • 9[9]P.L(o)bl,M.Huppertz,D.Mergel.Nucleation and growth in TiO2 films prepared by sputtering and evaporation[J].Thin Solid Films.1994,251:72-79.

二级参考文献12

  • 1卢柯.非晶态合金向纳米晶体的相转变[J].金属学报,1994,30(1). 被引量：50
  • 2Lu K, Wei W D, Wang J T. Grain growth kinetics and interfacial energies in nanocrystalline Ni-P alloys[J] .J Appl Phys, 1991,69(10) :7345 ～ 7347.
  • 3Aronne A, Pernice P, Marotta A. Crystallization of gel-derived zirconia glas.s[J].J Mater Sci Letts, 1991,10:1136 ～ 1138.
  • 4Ozawa T. Kinetics of non-isothermal crystallization[J]. Polymer, 1971,12:150 ～ 158.
  • 5Matusita K, Sakka S. Kinetic study of the crystallization of glass by differential scanning calorimetry[J]. Phys Chem Glasses, 1979,20:81 ～ 84.
  • 6Matusita K, Sakka S, Matsui Y. Determination of the activation energy for crystal growth by differential thermal analysis [J]. J Mater Sci, 1975, 10:961 ～966.
  • 7Pushan Ayyub, Manu Multani, Mustansir Barma, et al. Size-induced structural phase transitions and hyperfine properties of microcrystalline Fe2O3 [ J ]. J Phys C: Solid State Phys, 1988,21: 2229 ～ 2245.
  • 8Pelino M, Cantalini C, Veglio F. Crystallization of glasses obtained by recycling goethite industrial wastes to produce glass-ceramic materials[ J ]. J Materials Science, 1994, 29:2087 ～ 2094.
  • 9Landau D P. Phase transition in the ising square lattice with next-nearest -neighbor interactions[J]. Phys Rev B, 1980,21 (3):1285 ～ 1297.
  • 10SHAO Yanqun(邵艳群).The phasetransition and phase composition of nanoscale TiO2(纳米级二氧化钛的相转变与相结构)[D].福建:福州大学,1998.

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绍兴文理学院学报
2007年 第8期

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