摘要
采用KOH溶液湿法腐蚀制作阵列光开关的微反射镜上电极。腐蚀表面的不平整影响了光开关的驱动扭臂结构的制作。采用合理配比的HF,HNO3和CH3COOH腐蚀剂对制作的微反射镜阵列硅片进行抛光处理,抛光后微反射镜表面和腐蚀的(110)面均有较大的改善,并且抛光不影响器件的结构,最后制作出了均匀一致的光开关阵列扭臂驱动结构。
Micromirrors of optical switches array were fabricated by anisotropic etching in KOH aqueous solution. The roughness of etched (110) planes is an obstacle to fabricate the torsion beam structure. It can be settled by the reasonable mixture ratios of HF, HNO3 and CH3COOH. The etched (110) planes become smooth and reaction residues on the micromirrors can be removed in this mixture. Moreover, the architecture almost has no change for the slow etch rates of Si and Si3 N4 in the mixture. It is proved to be a better way to improve the fabrication process of optical switch torsion beam driving structure.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
2007年第3期361-362,366,共3页
Semiconductor Optoelectronics
基金
吉林省科技发展计划项目(20050319)