摘要
过去,作者曾发表了多种光敏引发体系引发烯类单体光聚合的工作,在研究2,2-二甲氧基苯乙酮在氧存在下引发甲基丙烯酸甲酯光聚合时,结合在聚合物链端的引发剂碎片具有光化学活性,在光聚合反应中产生高分子自由基,发生再次聚合。
A sequential photoinitiation. phenomenon was found in the benzophenone/triethylamine/ MMA radical photopolymerization system, which leads to increase of molecular weight, amine content of polymer formed with progressive irradiation time. The results, obtained demonstrate that the sequential photoinitiation originates from the photoreaction of active amine groups at the polymer chains with excited benzophenones producing a polymer radicals, which induce sequential polymerization. The effects of benzophenone and amine concentrations, oxygen content and chain requlator were studied. Reaction mechanism was also discussed.
出处
《高分子学报》
SCIE
CAS
CSCD
北大核心
1990年第1期123-128,共6页
Acta Polymerica Sinica
关键词
MMA
光聚合
光敏引发体系
Photopolymerization, Benzophenone/Amine/MMA system, Sequential photoinitiation