磁控溅射制备FeSi膜的性质

Films Material Prepared by Magnetron Sputtering

本文利用JGP-560CⅧ型带空气锁的超高真空多功能溅射系统在Si(100)和玻璃基底上沉积了介质薄膜、半导体薄膜、金属薄膜和磁性薄膜,通过实验研究得到各种薄膜较好的镀膜条件;并采用可变入射角椭圆偏振光谱仪对其中一些薄膜的光学性质进行了分析,研究了制备条件对薄膜在可见光范围内光学性质的影响;还研究了直流溅射、射频溅射、反应溅射的特点和它们的适用范围。

We produced medium films, semiconductor films, metal films, magnetic films on Si （100） and glass substrates by JGP - 560CⅧ ultrahigh] vacuum multiftmction sputtering system with the air lock and found the better conditions for preparing films in these experi,nents. Then we study their optical properties by alterable angle ellipsometry and the effect of producing conditions to optical properties at visible region. At the ,same time we study the characteristic and use of DC - magnetron sputtering, RF- magnetron sputtering and reactive magnetron sputtering.