用L-B膜实现MIS结构的C-V特性研究

RESEARCH ON C-V PROPERTY OF MIS STRUCTURE ARE DONE BY L-B FILM

测定了多种具有金属／L－B膜绝缘层／半导体（Si）结构的纳米厚度有机功能膜的C－V特性．研究发现C－V特性受到L－B膜的分子组分和氧化膜厚度的影响．

C-V property of organic function am is measured for some kinds of laminanted-layer structure of metal. L-B film insulation layer and semiconductor with nanometer thickness. It is found that C-V property is aff ected by molecular-organization composition and oxygenated film thickness.