摘要
基于横向寄生PNP管,提出了一种新颖结构的低失调CMOS带腺基准源。该带隙能够降低运放失调电压和镜像电流对基准电压的影响.提高带腺抗工艺失调的能力。仿真结果表明,基准电压为1.2280V,在—40℃~125℃.典型偏差小于2.7mV,温度系数为13.9ppm/℃。该带腺具有较好的工艺稳定性,在各工艺角情况下,失调电压小于±25.3mV.比传统带腺相对精度提高了3.3倍。最后,基于0.35μm CMOS工艺实现了该电压基准源。
Based on the parasitical lateral PNP, a novel CMOS bandgap voltage reference with low offset is presented. The errors caused by the input-offset voltage of the OP-AMP and the mismatch of current mirror can be minimized in the proposed architecture. Simulation shows that, the output voltage is 1.228 0V at 27℃, the total variation of output voltage is less than 2.7mY and the temperature coefficient is 13.9ppm/℃ over -40℃-125℃. Specially, the proposed bandgap has improved stability to process condition. In all process comer, the reference voltage changes less than + 25.3mV. The relative accuracy is increased by 3.3 times compared with traditional bandgap reference . At last, a complete bandgap reference is designed based on 0.35μm CMOS process.
出处
《微电子学与计算机》
CSCD
北大核心
2007年第7期156-159,共4页
Microelectronics & Computer