摘要
采用分子束外延方法在GaAs(100)衬底上生长GaSb体材料,以此GaSb为缓冲层生长了不同InAs厚度的InAs/GaSb超晶格,其10K光致发光谱峰值波长在2.0~2.6μm.高分辨透射电子显微镜观察证实超晶格界面清晰,周期完整.
GaSb thick layers were grown by molecular beam epitaxy on GaAs(100)substrates. High quality InAs/GaSb superlattices(SLs)with different InAs thicknesses were grown on GaSb buffer layers on GaAs substrates. The peak wavelengths of photoluminescence spectra at 10K are between 2~2.6μm. High-resolution transmission electron microscopy shows that the SLs have clear interface and integrated periods.
基金
国家自然科学基金资助项目(批准号:60607016
60625405)~~