Ni在酸性介质中钝化的现场X-射线衍射

Passivation Behavior of Ni in Acid Electrolyte by Using In-situ X-ray Diffraction Technique

采用θ-2θ型粉末衍射仪对Ni在H2SO4介质中的钝化过程进行了现场X-射线衍射(XRD)观测,同时收集Ni电极/溶液界面两侧的XRD谱图,采用差谱法分析Ni钝化前后界面两侧的结构变化。结果表明,钝化电位下,更多的H2O分子进入Ni电极表面及附近,其数目随钝化电位的升高而增大。H2O分子参与Ni的钝化过程,在Ni的钝化过程中起着重要的作用。钝化膜的厚度随着钝化电位的升高而增大。

The passivation process of Ni in H2SO4 was studied by diffraction method in situ X-ray on θ-2θ type powder diffractometer. The XRD spectrometry was obtained not only for the Ni electrode but also for the electrolyte. The difference spectrometry results show that water molecule play an important role during the passivation process of Ni. More water molecule moved to the surface and near Ni electrode with the increase of potentials. Water molecule takes part in the passivate reaction of Ni and results in the increse of the thickness of passivate film during the increasing of passivate potentials.