摘要
首先采用射频磁控溅射法在ZrO2陶瓷基体上沉积一层钠硼硅酸盐玻璃,并通过该钠硼硅酸盐玻璃薄膜作为中间层利用阳极键合方法实现了ZrO2陶瓷与单晶硅的间接连接。
zThis article continues to discuss a new method to use RF magnetron sputtering processing craft to deposit Na2O-B2O3- SiO2 glass thin film on the ceramic substrate. Na2O-B2O3-SiO2 glass thin film is suitable for anodic bonding as the intermediate layer. It is an essential precondition for realizing indirect connection of ZrO2 and Si.
出处
《机械工程与自动化》
2007年第4期74-76,共3页
Mechanical Engineering & Automation
基金
山西省自然科学基金资助项目(20031051)
关键词
阳极键合
射频磁控溅射
钠硼硅酸盐玻璃薄膜
anodic bonding
RF magnetron sputtering
Na2O-B2O3-SiO2 glass thin film
