摘要
给出了动态真空镀铬保证安全成膜时被镀件不应超过的临界转速ｎ临。
Critical rotating speed of vacuum plating Cr was given under the condition of ensuring plating Cr reliably.A theoretical basis was provided for safly plating Cr on cylinder side of aim generator disk in the form of revolving.
出处
《光学精密工程》
EI
CAS
CSCD
1997年第1期79-83,共5页
Optics and Precision Engineering
关键词
动态真空镀铬
动态目标盘
镀膜
薄膜
Dynamic vacuum plating Cr,Aim generator disk,Critical rotating speed
