摘要
为了了解氢渗透阻挡层的阻氢机理,在氢化锆表面电镀Cr-C后,再对镀层进行热处理(400℃),最后把试样在700℃的真空中保温10h。用EDS法对没有进行热处理的镀层的成分进行分析,再用X射线光电子能谱(XPS)研究氢渗透阻挡层不同深度处的化学态,并对阻挡层原子进行定量分析。结果发现:未热处理的镀层主要含有C和Cr,阻挡层中含有C、O、Cr和Zr,进行氢渗透试验(700℃保温)后的阻挡层中C—H和O—H含量都增加,前者更明显。由此可说明H因破坏C、O原来的成键方式而被C、O捕捉,C对氢渗透阻挡层的作用大于O的作用。
Cladding was heat treated after electrodeposited chromium-carbon on the surface of zirconium hydride, in order to see mechanics of the hydrogen permeation barrier, zirconium hydride simple was insulated at 700℃ for 10h. The constituent of unannealed cladding was analyzed. Surface bonding states of different depths in hydrogen permeation barrier of zirconium hydride were investigated by XPS, and atoms of the barrier were analyzed quantitatively. The results show that carbon and chromium are the main constituents of unannealed cladding. It also show that it exits C, O, Cr, Zr in the barrier. By analyzing the content of the C-H and O-H bonding which are increased after hydrogen permeation experiment (700℃ thermal retardation) , and the content of the C-H bonding increases more abviously. A conclusion can be draw that Hydrogen is captured by C and O because it can destroy bondings which contain C or O and C is better to the hydrogen permeation barrier than O.
出处
《表面技术》
EI
CAS
CSCD
2007年第4期39-41,56,共4页
Surface Technology
基金
总装备部预研基金项目(51481260105SC0301)
关键词
氢化锆
阻挡层
碳
氧
Zirconium hydride
Permeation barrier
Carbon
Oxygen