反应蒸发沉积NiOx薄膜的电致变色性能

Electrochromic properties of NiO_x coating deposited by evaporation

利用WO3和NiO的互补显色可以大大提高电致变色玻璃的变色效率。有关WO3薄膜的制备方法及其性能已有许多文献作了报道。已报道的NiOx薄膜常用金属镍的射频反应溅射或电子束反应蒸发方法制备。前者沉积速率较慢，电致变色响应速度及透射率变化范围均不如后者[1]。本文介绍的金属镍反应闪蒸方法无需电子束设备，所制备的G／ITO／NiOx系统在2MKOH溶液中的饱和着色和漂白的透射光谱测试表明，相对于人眼峰值响应（λ＝550nm）的透射率变化范围达60％以上，薄膜的电致变色响应速度、沉积速度也优于反应溅射工艺。

The electrochromic efficiency of electrochromic glasses can be enhanced by using WO3/NiO complementary electrochromic effect. The behaviors of WO3 coating and methods of its production have been reported in literature. Up to now reported NiOx coating are usually produced by rf reactive sputtering or electron beam reactive evaporation (BEV). The depositing rate of the former is slower. The electrochromic response and the change range of transmissivity for the BEV are better than that for the rf sputtering. The reaction flash evaporation method of nickel presented in this paper is without equipment of BEV. For produced systems with G/ITO/NiOx in 2M KOH solution the measured results of transmissivity spectrum to saturated colour state and bleached state indicate that the changes of transmissivity are over 60% for eye peak response (λ=550nm ). Its electrochromic response and depositing rate are also better than those of rf sputtering technology.