摘要
采用一种新型的离子束辅助非平衡反应磁控溅射设备制备了TiN/AlN纳米多层复合膜。采用XRD衍射、TEM、显微硬度计和干涉显微镜对TiN/AlN纳米多层膜的微结构和力学性能进行了表征。结果表明:TiN/AlN多层膜有良好的周期;调制结构影响薄膜的择优取向,薄膜整体表现出硬度增强的效果,硬度随调制周期的变化而变化并在调制周期为7.5nm时达到最大值。
TiN/AlN nano-multilayer films were deposited by an ion-beam aided unbalanced reactive magnetron sputtering system. The microstructure and mechanical properties of the films were characterized by X-ray diffraction,transmission electron microscopy, microhardness tester and optical interferometer. The results showed that the TiN/AlN nano-multilayer film has good periodic modulation to affect significantly its preferred growth orientation. As a whele, the hardness of the films increases and varies with the modulation period, and it comes up to the maximum when the period is 7.5nm.
出处
《真空》
CAS
北大核心
2007年第4期52-54,共3页
Vacuum
关键词
纳米多层膜
调制周期
非平衡反应磁控溅射
力学性能
nano-multilayer film
modulation period
unbalanced reactive magnetron sputtering
mechanical properties
