摘要
用原子力显微镜(AFM)对直流溅射和射频溅射制备铝膜的表面粗糙度及颗粒大小进行了分析比较.实验结果表明:溅射功率和溅射时间对铝膜表面粗糙度有影响,通过延长溅射时间或提高溅射功率可使膜的平均颗粒直径增大.
The roughness and granularity of Al film prepared by DC and RF magnetron sputtering are analyzed using AFM. The experimental results indicate that the surface roughness of Al film prepared by DC sputtering is bigger than those of Al films prepared by RF sputtering, and the average granule diameter increases with long sputtering time and large sputtering power.
出处
《物理实验》
2007年第8期42-46,共5页
Physics Experimentation
