摘要
研究了一种用于抛光等离子体溅射CVD法制备的金刚石自支撑膜的高效安全的抛光工艺。试验探索了转盘转速、金刚石粉颗粒尺寸、磨盘表面形状对金刚石自支撑膜磨抛速率的影响。研究表明:带槽盘对金刚石自支撑膜的粗研磨效果明显,速率较高,平面盘对提高金刚石自支撑膜的表面粗糙度有利;不同颗粒的金刚石粉对应着各自合适的能充分利用其磨削能力的转速,在这个转速下,金刚石自支撑膜的磨抛速率在12μm/h左右。本文通过对新的工艺参数的探索,为金刚石自支撑膜后续加工提供有力的技术支持。
This paper researched an optimizational technology of mechanical polishing for the large area free-standing diamond films deposited by DC arc plasma jet CVD.Research showed the effect of grinding pan,rotational speed and diamond powder size on polishing speed.The result shows： the grooved pan is good at rough polishing and increasing grinding speed.The smooth pan is fit for fine polishing and improving the roughness.The different grain sizes of diamond powder match the fit rotational speeds of grinding pan to attain the highest grinding capability.In our research,the grinding speed is around 12μm/h.It is important that the new technological parameter researched for subsequent machining of the large area free-standing diamond films.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2007年第7期1173-1175,共3页
Journal of Functional Materials
基金
博士点基金资助项目(20040008018)
关键词
金刚石自支撑膜
机械抛光
优化工艺
free-standing diamond film
mechanical polishing
optimizational technology
