自偏压对含氢非晶碳膜光学特性的影响

Self-Bias Voltage and Optical Property of Hydrogenated Amorphous Carbon Films

利用射频等离子体增强化学气相沉积(RF PECVD)方法,以CH4、Ar和H2为气源,在CR-39树脂材料上制备出了含氢非晶碳膜(a-C∶H膜)。研究了不同偏压对a-C∶H膜生长过程和光学特性的影响。使用激光拉曼光谱(Raman)和傅里叶变换红外光谱(FTIR)对样品的结构和成分进行了表征,分别使用纳米压痕仪和紫外一可见光分光光度计测试了样品的机械和光学特性。结果表明,自偏压对a-C:H膜的生长具有重要影响。随着自偏压的升高,所沉积a-C∶H膜中的sp3含量降低,薄膜的硬度和光学透过率也下降。

Hydrogenated amorphous carbon （a-C：H） films were synthesized by RF plasma enhanced chemical vapor deposition （PECVD）, in a mixture of CH4, Ar and H2 ,on allyl diethylene glycol carbonate（CR-39） substrates. The films were characterized with Raman spectroscopy, Fourier transform infrared spectroscopy（ FTIR）, ultraviolet-visible（UV-Vis） spectroscopy and conventional mechanical techniques to optimize the film growth conditions. The results show that the self-bias voltage significantly affects the characteristics of the a-C： H films, For instance, as the self-bias voltage increases, the density of sp3 bond lowers; its hardness and its optical transmission rate also decreases, Possible mechanism was tentatively discussed.