期刊文献+

投影机用UHP灯性能及寿命延长措施

Function of Lamp Used in Projectors and the Measurement for Long Life
下载PDF
导出
摘要 超高压汞灯(UHP)是液晶投影仪和液晶背投电视的光源,具有光效高、寿命长、光谱好和接近理想的点光源等特点,在DLP,LCD,LCOS等各种液晶投影显示系统中应用广泛。从安全使用的角度介绍了UHP灯芯和灯碗结构特点和设计要求,对UHP灯光谱特征以及延长UHP灯使用寿命的关键措施进行了讨论,并强调了合理的电气工作条件的重要性。 Ultra High Power(UHP) is the light source of Liquid Crystal Display(LCD) projectors and LCD back- projection television. The UHP light source has the advantages of high luminescent efficiency, long lifetime, good spectrum and low caloric value and so on,and has been widely used in DLP,LCD and LCOS. For the sake of safety,the introduction is made of the structural features and demanded design of UHP's lamp mount and lamp bowls. The discussion is made on the key measurement for the characteristics of light spectrum and long life in use. The further emphasis is laid on the importance of reasonable electric condition.
出处 《现代电子技术》 2007年第16期1-3,9,共4页 Modern Electronics Technique
关键词 超高压汞灯 DLP LCD LCOS UHP lamp DLP LCO LCOS
  • 相关文献

参考文献6

  • 1Fischer E.Ultra High Performance is Charge Lamps for Projection TV Systems[C].8 th Int.Symp.on Light Sources,Greifswald,Germany,1998.
  • 2Moench H,Derra G.Light Sources for Video Projection[C].8th Int.Symp.on Light Sources,Greifswald,Germany,1998.
  • 3Monch H,Derra G,Fischer E.Optismised Light Sources for Projection Displays[C].SID 1999.
  • 4Stewart C N,Rutan D M,Jacobson B A,et al.Lamp and Optics Design Considerations in Hort Arc Metal Halide Systems fo LCD Projection[A].Proceedings of the Fourth International Display Workshops-IDW'97[C].Nagoya:Nagoya Congress Center,1997:797-800.
  • 5熊胜明,张云洞,唐晋发.电子束反应蒸发氧化物薄膜的应力特性[J].光电工程,2001,28(1):13-15. 被引量:6
  • 6Monch H,Derra G,Fiser E.Optimize Light Sources for Projection Displapys.Philips Research Laboratories.

二级参考文献10

  • 1[1]Ennos A E. Stresses Developed in Optical Film Coatings[J]. Appl.Opt, 1996,5(1):51-61.
  • 2[2]Windischmann H. Intrinsic Stress in Sputtered Thin Film[J]. J.Vac.Sci.Technol, 1991,A9(4):2431-2436.
  • 3[3]Doerner M F, Nix W D. Stresses and Deformation Processes in Thin Films on Substrates[J]. CRC Critical Review in Solid State Science, 1988,14(3):225-268.
  • 4[4]Windischmann H. An Intrinsic Stress Scaling for Polycrystalline Thin Films Prepared by Ion Beam Sputtering[J]. J.Appl.Phys, 1987,62(5):1800-1807.
  • 5[5]Pulker H K. Coating on Glasses[M]. Amsterdam:Elservier, 1984.
  • 6[6]Rastogi R, Dharmadhikari V, Diebold A. Stress Variation with Temperature Time and Its Correlation to Film Structure and Deposition Parameters[J]. J.Vac.Sci.Technol, 1991, A9(4):2453-2458.
  • 7[7]Murakami M. Deformation in Thin Films by Thermal Strain[J]. J.Vac.Sci.Technol, 1991,A9(4):2469-2476.
  • 8[8]Rigneault H, Mahodaux C, Giovannini H, et al. Mechanical Properties of Dielectric Thin Films[J]. SPIE, 1997, 3133:176-182.
  • 9[9]Townsend P H, Barnett D M, Brunner T A. Elastic Relationship in Layered Media with Approximation for the Case of Thin Films on Thick Substrate[J]. J.Appl.Phys,1987,62(11): 4438-4444.
  • 10[10]Klocek P. Handbook of Infrared Optical Materials[Z]. New York:Marcel Dekker, Inc, 1991.

共引文献5

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部