摘要
低分子比铝电解质的槽电阻-Al2O3浓度曲线是实现低分子比铝电解而进行Al2O3下料自动控制的基础。本文在实验室铝电解槽上使用低分子比电解质,应用Le-BlanceI-U曲线法测定了槽电阻计算式R=(U-Vext)/I中的常数值Vext,并通过测定槽电压U,槽电流I和Al2O3浓度,研制了槽电阻-Al2O3浓度曲线。结果表明:Vext的值的范围为162~168V,平均值为165V,槽电阻-Al2O3浓度曲线上都存在槽电阻极小值,并且随电解质分子比减小,槽电阻极小值增大,而槽电阻极小值所对应的Al2O3浓度减小。对使用分子比为20~26电解质的工业电解槽,Al2O3浓度可控制在槽电阻-Al2O3浓度曲线极小值左侧的2%~3%范围内,槽内既不会产生沉淀又不会发生阳极效应,节省电能并取得良好指标。
The auto control of Al 2O 3 feed to realize low cryolite ratio aluminium electrolysis is based on the relationship curves of pseudo-resistance vs alumina concentration in low cryolite ratio electrolytes In a bench-scale aluminium electrolysis cell the authors measured the value of Vext in the expression of pseudo-resistanceR=(U-Vext)/I]by Le-Blance I-U curve method,cell voltage V,cell current Iand Al 2O 3 concentration in low cryolite ratio electrolysis The relationship curves of pseudo-resistance vs alumina concentration at various ratios were plotted The study results were as follows:the range of Vext was from 1 62V to 1 68V,the average value was1 65V ,there were minima of pseudo-resistance on the curves of pseudo-resistance vs Al 2O 3 concentration;with decreasing of the cryolite ratio of bath the minima of pseudo-resistance increased and the corresponding alumina concentration values to the minima of pseudo-reistance decreased The industrial electrolysis cells with 2 0-2 6 cryolite ratio electrolytes may be operated and controlled at 2%-3 wt% range of alumina concenration on the left-hand side of the minimum point,the sludge and the anode effect do not occur,a good production performance can be obtained and energy-saving can also be achieved
出处
《有色金属》
CSCD
1997年第2期53-56,52,共5页
Nonferrous Metals
基金
国家自然科学基金
关键词
低分子比
电解质
槽电阻
炼铝
电解
三氧化二铝
low cryolite ratio electrolyte
pseudo-resistance
alumina concentration