厚层抗蚀剂光刻技术研究进展

On the development of the study of thick photoresist lithography techniques

厚层抗蚀剂光刻是一种制作深浮雕结构的微细加工技术。综述了近年来厚层抗蚀剂光刻技术的最新进展,从厚层抗蚀剂光刻工艺原理以及计算机模拟诸方面分析了该技术区别与传统光刻的一些特点,并对其应用的研究现状进行了总结,最后指出了进一步发展厚层抗蚀剂光刻技术的关键问题。

Thick resist lithography is one kind of micromachining techniques fabricating relief microstructures at great depth. The recent new development of the technique is summarized. The characteristics of thick resist lithography technique different from those of traditional technique are analyzed on the principle of lithography process and computer simulations. Applications of the technique are also summarized. Finally,some key problems on developing thick resist lithography are pointed out.