MoS_2-Au共溅膜的结构与性能之研究

A Study on the Structures and Performances of MoS_2-Au Co-sputtered Films

作者利用扫描电子显微镜(SEM)、X-射线衍射仪(XRD),俄歇电子能谱仪(AES)和X—射线光电子能谱仪(XPS)等对MoS_2-Au共溅膜的形貌和结构进行了观察与分析,并就这种膜的厚度对耐磨寿命的影响及其抗湿性与MoS_2溅射膜的作了比较,认为共溅膜的柱状聚集体结构是其具有良好性能的原因。溅射时氩气压强对MoS_2-Au膜结构和性能影响的研究结果表明,不同氩气压强下得到的MoS_2之结晶度不同,因而共溅膜的摩擦学性能也不相同。作者还就膜与底材的结合强度同耐磨寿命的关系,以及底材表面缺陷对膜结构的影响进行了讨论。

The topography and structure of MoSa-Au co-sputtered films were analysed by means of SEM, XRD, AES and XPS. The MoS2-Au films possessed a close columnar structure. The oxidation of these films were slower in moisture environment than that of MoSz films, and the wear life increased with increasing of film thickness. It was shown that good performance was related to the close columnar structure of the MoSj-Au films. The influence of argon pressure during sputtering on structure and performance of MoSj-Au co-sputtered films was tested. The results showed, under different argon pressures, different crystallinities of MoSz and tri-bological properties were obtained. Sputtering at argon pressure of 11.0 Pa, the wear life of the film was the longest, and the structure was crystalline with stochastic orientation. The amophous structure films was produced at argon pressure of 5.3 Pa. Its wear life were short and the friction coefficient was unsteady and higher. A corresponding relation existed in the adhesion between film and substrate and the wear life of co-sputtered film. The influence of surface defects of substrate on structure of film was also discussed.