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Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten

Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten
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摘要 Particle melting and substrate temperature are important in controlling deposited density and residual stress in thermal plasma deposition of refractory materials. In this paper, both the heating and cooling behaviours of tungsten particles inside a radio frequency inductively coupled plasma (ICP) and the plasma heat flux to the substrate were investigated. The distribution of the plasma-generated heat on device, powder injection probe, deposition chamber, and substrate was determined by measuring the water flow rate and the flow-in and flow-out water temperatures in the four parts. Substrate temperature was measured by a two-colour pyrometer during the ICP deposition of tungsten. Experimental results show that the heat flux to the substrate accounts for about 20% of the total plasma energy, the substrate temperature can reach as high as 2100 K, and the heat loss by radiation is significant in the plasma deposition of tungsten. Particle melting and substrate temperature are important in controlling deposited density and residual stress in thermal plasma deposition of refractory materials. In this paper, both the heating and cooling behaviours of tungsten particles inside a radio frequency inductively coupled plasma (ICP) and the plasma heat flux to the substrate were investigated. The distribution of the plasma-generated heat on device, powder injection probe, deposition chamber, and substrate was determined by measuring the water flow rate and the flow-in and flow-out water temperatures in the four parts. Substrate temperature was measured by a two-colour pyrometer during the ICP deposition of tungsten. Experimental results show that the heat flux to the substrate accounts for about 20% of the total plasma energy, the substrate temperature can reach as high as 2100 K, and the heat loss by radiation is significant in the plasma deposition of tungsten.
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第4期427-430,共4页 等离子体科学和技术(英文版)
关键词 induction plasma thermal spray deposition TUNGSTEN substrate temperature heat radiation induction plasma, thermal spray deposition, tungsten, substrate temperature heat radiation
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参考文献13

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