摘要
本文阐述了石英晶片真空蒸发镀膜测控的基本原理和镀膜过程中石英晶片谐振频率变化与镀膜厚度之间的关系。主要研究了以W77E516单片机为核心,配合其它相关芯片完成石英晶片真空蒸发镀膜过程测控系统的工作原理和实现方案,重点阐述了该系统的硬件设计和软件设计方法。
The principle of measurement and control technology used in quartz crystal vapor plating in the vacuum state and the relation between the changes of quartz crystal resonance frequency and film thickness is introduced in this paper. The paper researched on the theory and scheme of quartz crystal vapor plating system which base on W77E516 and associate with relative chips,the design of hardware and software are given emphasis to explain.
出处
《微计算机信息》
北大核心
2007年第04Z期131-133,共3页
Control & Automation
基金
北京市重点实验室(机电系统测控)开放项目(52053005(J))
关键词
石英晶片
谐振频率
蒸发镀膜
Quartz Crystal,Oscillatory Frequency,Vapor plating
