一种PN结隔离互补双极工艺

Complementary Bipolar Process Based on P-N Junction Isolation

介绍了几种互补双极工艺的结构和特点,详细阐述了一种基于N型外延的PN结隔离互补双极工艺;着重探讨了隔离制作技术和PNP管设计要点,并对实际流片结果进行了讨论。

A number of complementary bipolar process technologies are introduced, together with their features and advantages. A p-n junction isolated complementary bipolar technology based on N-type epitaxial wafers is described in detail. Essentials of the isolation control and PNP transistor design are investigated in particular. And finally, discussions are made on results from processed wafers.