摘要
对采用磁控溅射法制备金属W薄膜,研究了不同厚度W薄膜退火晶体取向和表面结构的动态演变过程。结果表明:在较薄的膜中,表面能最低的晶面(110)处于支配地位,导致(110)择优取向增强;薄膜表面结构颗粒尺寸增大。当薄膜超过临界厚度,应变能开始起主导作用,薄膜(110)择优取向程度随厚度的增加而下降,表面结构颗粒减小。薄膜晶体取向和表面结构都存在厚度尺寸效应,这依赖于表面能和应变能的动态平衡过程。薄膜表面形貌和晶体结构之间存在对应关系。
Crystalline orientation and surface morphology of annealed tungsten thin films deposited by RF - sputtering is studied as a function of their thickness. The experimental results show that with the increasing thickness the （ 110 ） texture and the surface grain size increase initially then decrease above 180nm, which can be explained by the dynamic competition between the strain energy and the surface energy. The evolutions of surface morphology may reflect the changes of the crystalline structure.
出处
《机械研究与应用》
2007年第4期41-42,45,共3页
Mechanical Research & Application
关键词
晶体取向
表面形貌
薄膜
crystalline orientation
surface morphology
thin film
