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磁头研抛工艺规律研究

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摘要 计算机硬盘其存储容量的发展要求不断降低磁头在硬盘表面的飞行高度,从而要求硬盘磁头的表面粗糙度越来越小。分析一种目前普遍应用于工业的技术:浮法抛光法,研究其研抛工作时工艺参数对磁头表面的影响情况,寻求一个何时的研抛参数和影响因素,以求达到快速加工,降低成本。
出处 《中山大学学报论丛》 2007年第8期282-285,共4页 Supplement to the Journal of Sun Yatsen University
基金 国家自然科学基金重大项目资助项目(50390061)
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