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α-Si_3N_4陶瓷的液相烧结及其介电性能 被引量:2

Liquid Phase Sintering and Dielectric Property of α-Si_3N_4 Ceramics
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摘要 以MgO、Al2O3和SiO2作为烧结助剂,采用放电等离子烧结(SPS)方法制备密度可控的α-Si3N4陶瓷材料。讨论了SPS方法制备α-Si3N4陶瓷材料的烧结行为和烧结机理,以及烧结助剂添加量和烧结温度等影响因素与材料密度的关系。结果表明:当烧结温度为1400~1500℃,烧结助剂添加量为9%~28.5%(质量分数,下同)时,可以制备出密度可控,且密度变化范围为2.48~3.09g/cm3的α-Si3N4陶瓷材料,试样的主相为α-Si3N4,烧结机理为SPS低温液相烧结,材料在频率为1MHz时的介电常数为5~7.5,与密度关系密切。 Spark plasma sintering (SPS) was applied to prepare α-Si3N4 ceramics of different controlled densities with magnesia, silicon dioxide, alumina as the sintering aids and the relationship between density of samples, the content of sintering aids and dielectric property was explored. The sintering behavior of SPS method and mechanism of liquid phase sintering (LPS) were discussed and the factors of the content of sintering aids and sintering temperature influencing the density of the prepared samples were analyzed. The results show that the ceramics with controllable density 2.48 g/cm^3 to 3.09 g/cm^3 could be prepared successfully when the sintering temperature was 1400-1500 ℃ and the amount of sintering aids was 9wt% -28.5wt %. The main phase was α-Si3N4 and the sintering mechanism was liquid phase sintering. The dielectric constant below 1 MHz frequency ranged from 5 to 7.5 and was closely dependent on the density of obtained samples.
出处 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2007年第A01期259-262,共4页 Rare Metal Materials and Engineering
基金 教育部新世纪优秀人才支持计划(NCET-05-0661)
关键词 放电等离子烧结(SPS) 液相烧结(LPS) α-氮化硅 烧结助剂 介电性能 spark plasma sintering (SPS) Liquid Phase Sintering (LPS) α-Si3N4 sintering aids dielectric property
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参考文献8

  • 1Riley F L.Journal of American Ceramic Society[J],2000,83(2):245
  • 2Ruisong(郭瑞松),Cai Shu(蔡舒),Ji Huiming(季惠明) et al.Engineer & Structure Ceramics(工程结构陶瓷)[M].Tianjin:Tianjin University Press,2002:169
  • 3Guge E,Woetting G.Industrial Ceramic[J],1999,19(3):196
  • 4Frederick H S,Juris V.Processing of the 16th Symposium on Electromagnetic Windows[C].Atlanta,USA:Georgia Institute of Technology,1982:81
  • 5Barta J,Manela M.Processing of the 16^th Symposium on Electromagnetic Windows[C].Atlanta,USA:Georgia Institute of Technology,1982:87
  • 6高濂,宫本大树.放电等离子烧结技术[J].无机材料学报,1997,12(2):129-133. 被引量:117
  • 7张东明,傅正义.放电等离子加压烧结(SPS)技术特点及应用[J].武汉工业大学学报,1999,21(6):15-17. 被引量:70
  • 8Nygren M,Shen Z.Key Engineering Materials[J],2004,264-268:719

二级参考文献3

  • 1WD金格瑞 清华大学(译).陶瓷导论[M].北京:中国建筑工业出版社,1982.472-494.
  • 2高濂,宫本大树.放电等离子烧结技术[J].无机材料学报,1997,12(2):129-133. 被引量:117
  • 3T. Nishimura,M. Mitomo,H. Hirotsuru,M. Kawahara. Fabrication of silicon nitride nano-ceramics by spark plasma sintering[J] 1995,Journal of Materials Science Letters(15):1046~1047

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