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InAs/GaAs亚单层结构的静压光谱研究

PHOTOLUMINESCENCE OF InAs/GaAs SUBMONOLAYER STRUCTURE UNDER HYDROSTATIC PRESSURE
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摘要 在15K下测量了InAs/GaAs亚单层结构的静压光致发光,静压范围为0~8GPa.常压下InAs层中重空穴激子的发光峰随InAs层厚的减小向高能移动,同时峰宽变窄,强度减小.其压力行为与GaAs基体的基本一致,表明量子阱(线、点)模型仍适用于InAs/GaAs亚单层结构. The photoluminescence of InAs/GaAs submonolayer structure was measured at 15K under hydrostatic pressure up to 8 GPa. At normal pressure, the peak energies of the heavy hole exciton emission have a blue shift with the decrease of the thickness of the InAs layer, and with a narrowing peak width and weakening peak intensity. The pressure behavior of these peaks is similar to that of the GaAs matrix, indicating that the model of quantum well (quantum wire, quantum dot) structure is still valid for InAs/GaAs submonolayer. The increases of the confined energies for electrons and heavy holes are 23 and 42 meV, respectively, for 1/3 monolayer InAs/GaAs sample due to the additional lateral confinement of carriers.
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 1997年第2期131-136,共6页 Journal of Infrared and Millimeter Waves
基金 国家自然科学基金
关键词 亚单层 静压 光致发光 砷化铟 半导体 InAs/GaAs submonolayer, hydrostatic pressure, photoluminescence.
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参考文献5

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