电化学合成的含双键聚硅烷

Polysilane with Double Bonds by Eelctrochemical Synthesis

采用电化学合成法,将甲基三氯硅烷与烯丙基氯进行聚合,合成出带有双键的聚硅烷,通过FT-IR,UV,1H-NM R,GPC表征了其结构,测定了产物的双键含量,并对产物进行了交联固化和高温裂解实验。结果表明,产物中双键保留率为8.2%,双键的引入使聚硅烷获得了很高的质量保留率及较高的陶瓷产率。

A polysilane with double bonds was synthesized by electrochemical method, using methyltrichlorosilane and allyl chloride as monomers. The product was characterized by FT-IR, UV, 1H-NMR, GPC. Its double-bond content was determined. The cross-linking and pyrolysis of it were studied. The results show that the retaining ratio of double bonds is 8.2%. The introduction of double bonds in polysilane brings forth much higher mass retaining ratio and better ceramic yield.