摘要
针对大面积、高产量和节约型印制电路板(PCB)生产使用的激光投影光刻机,利用ZEMAX工程光学设计软件,对其投影系统进行了模拟设计与优化,并对优化后的结果进行了分析。对于设计的激光投影系统,其特征尺寸分辨力达到了9μm,全视场波像差小于λ/4,畸变小于0.000007%,这些指标符合实际要求。
For the laser projection lithography system used for the production of large-area, high processing throughput, and cost-effective Printed Circuit Boards (PCBs), its projection lenses were simulation-designed and optimized using ZEMAX optical design software, and the optimized results were analyzed. For the designed laser projection lithography, its resolution for feature sizes is 9um, its optical path difference for entire field of view is less than λ/4, and its distortion is less than 0.000007%. These data accords with demands of technical specifications.
出处
《光电工程》
EI
CAS
CSCD
北大核心
2007年第9期46-49,102,共5页
Opto-Electronic Engineering
基金
广州市科技计划项目(2006Z3-D0041)
广东省自然科学基金(07001789)