重掺杂Bi:YIG溅射薄膜的磁和磁光性能

The Magnetic and Magneto-optical Properties of Heavily Bi-Doped YIG (Bi: YIG) Sputtering Film Annealed by RTA Method

用磁控溅射+快速退火晶化处理在 YAG、Al2O3基片上制备了重掺杂 Bi:YIG 磁光薄膜,利用X射线衍射(XRD)、原子力显微镜(AFM)、磁光克尔仪/光学分度计、振动样品磁强计(VSM)分别研究了薄膜的微结构、磁光性能和磁性能。薄膜的饱和磁化强度为 135～139 kA/m,不同基片上制备的薄膜的矫顽力不同,薄膜的法拉第角在 450～610nm的光波段范围内约为3～5°/μm;当退火温度在600℃时,在两种基片上制备的薄膜透射率谱非常相似,当退火温度为800℃时,在Al2O3基片上的薄膜透射率谱将出现一个台阶。

In this paper, the magnetic and magneto-optical properties of heavily doped Bi： YIG sputtering film have been studied. The film was deposited by radio frequency magnetron sputtering method and crystallized by rapid thermal annealing （RTA）, The results show that the RTA treated film has good properties both in microwave and optical wave band. The saturation magnetization of the film on different substrates varies from 135 to 139kA/m. The coercivity of the film on different substrate are different. The Faraday rotation is about 3-5deg/pm when optical wavelength ranges from 450nm to 610nm. The transmission spectra of the Bi：YIG films on two kinds of substrates has similar change as annealing temperature below 600℃. Specially, when annealing temperature is above 800℃ a step is observed between 550nm and 650nm wavelength for the film deposited on Al2O3 substrate.